成果報告書詳細
管理番号20110000000244
タイトル*平成22年度中間年報 太陽エネルギー技術研究開発/太陽光発電システム次世代高性能技術の開発/次世代多接合薄膜シリコン太陽電池の産学官協力体制による研究開発
公開日2011/7/28
報告書年度2010 - 2010
委託先名太陽光発電技術研究組合
プロジェクト番号P07015
部署名新エネルギー部
和文要約和文要約等以下本編抜粋:1. 研究開発の内容及び成果等 競争力を有しかつ商用電源として利用可能な高効率かつ低コストを有する薄膜シリコン太陽電池の開発を行う。本開発は、多接合薄膜シリコン太陽電池高効率化要素技術開発、薄膜シリコン大面積高生産性製膜技術開発、薄膜シリコン系太陽電池モジュールシステム化技術開発より構成される。多接合薄膜シリコン太陽電池高効率化要素技術開発においては、トップセルの高効率化技術開発高性能、低コスト透明電極材料の開発、新規光閉じ込め技術の開発等により安定化効率14%以上(1cm2)を目指す。また、薄膜シリコン大面積高生産性製膜技術開発では一辺2m超の基板に対応可能なVHFプラズマ源の開発を目指す。本研究開発は6企業1機関で構成されるコンソーシアムと再委託先6大学により実施されるものであり、サブテーマ毎の成果を以下に示す。
英文要約Title: Research & Development for Multi-junction Thin-film Silicon Solar Cells for the future by the Consortium composed of Industry, Government and Academia (FY2010-FY2012) FY2010 Annual Report
In order to reduce the power-generation cost of thin-film silicon solar cells comparably to the cost of commercial power supply with the competitiveness against another type of solar cells, the research and development (R&D) for “technologies for multi-junction thin-film-silicon solar cells with high efficiency”, “highly-productive deposition technologies for thin-film silicon solar cells with large area”, and “system technologies for thin-film silicon solar modules” have been performed since this fiscal year.: The R&D target for the technologies for multi-junction thin-film silicon solar cells with high efficiency is to achieve 14% stable efficiency for 1cm2 area with the development of highly stabilized a-Si films for the top cell, the development of μc-SiGe for the bottom cell, the development of high performance and low cost transparent conductive materials, and the development of light-trapping technologies. As one of main results in this fiscal year, the highly stable and efficient a-Si:H solar cells were obtained by using a triode plasma CVD technique. Single-junction p-i-n type a-Si:H solar cells subjected to degradation under 1-sun illumination at 50oC for 1000 hours showed a stabilized efficiency of 9.6% with a relatively low degradation ratio of 11%. It was further demonstrated that the degradation ratio can be reduced to as low as 4% by applying this deposition technique to the a-Si:H top cell of a-Si:H/μc-Si:H tandem solar cells.: The R&D for highly-productive deposition technologies for thin-film silicon solar cells with large area mainly consists of the development of VHF plasma sources, the development of large-area deposition process, and the development of evaluation technologies for large-area devices in order to achieve the following targets; “Applicable to use the substrates with a side of 2 m or more”, “Film thickness distribution within 10%”, “Deposition rate of 2 nm/sec or more for μc-Si:H”.: We investigate three kinds of VHF plasma sources, and plan to determine the best one for the demonstration of large-area deposition by using the substrates with a side of 2 m or more.: In this fiscal year, the deposition-pretest machine and plasma simulators for the development of VHF plasma sources were introduced. The CVD machine which can handle G5-size substrates was introduced to PVTEC laboratory and is now being set up for the development of large-area deposition process.
ダウンロード成果報告書データベース(ユーザ登録必須)から、ダウンロードしてください。

▲トップに戻る