成果報告書詳細
管理番号20110000001185
タイトル*平成22年度中間年報 ナノテク・先端部材実用化研究開発/ナノ領域の非破壊・三次元計測を実現する次世代X線管の研究開発
公開日2011/9/9
報告書年度2010 - 2010
委託先名浜松ホトニクス株式会社 東京エレクトロン株式会社
プロジェクト番号P05023
部署名電子・材料・ナノテクノロジー部
和文要約和文要約等以下本編抜粋:1. 研究開発の内容及び成果等
1)研究開発の内容
(1)事業目的
半導体(情報家電)や電力貯蔵(環境・エネルギー)など、新産業創造戦略重要5分野での複数分野において、100nmの分解能にて短時間に非破壊で三次元計測するニーズがある。ところが、従来型のX線管は、電子ビームを絞ることにより高分解能化(100nm)を実現しているが、微小焦点で電子ビーム量を上げるとターゲットが劣化するなど分解能とX線量(計測のスループット)を両立できない。この限界を克服するため、ナノ加工技術を利用する革新的ターゲットを導入した次世代X線管(ナノターゲットX線管)を開発することを目的とする。
(2)事業概要
ナノ加工技術を利用して作製するナノピラーターゲットを搭載したナノターゲットX線管を開発する。そのため集束イオンビーム装置(FIB)を用いたナノピラーターゲットの形成を研究する。また、微細なナノピラーターゲットの位置を探す電子ビーム制御系を開発するとともに、これら要素技術を検証しX線源としての性能を評価する。
(3)事業内容(主たる担当をサブテーマの後部に記載)
上記目的を達成するために、以下の研究開発を実施する。
英文要約In the fields of semiconductor or Li battery, non-destructive inspection at the resolution of less than 100nm is strongly demanded. However, current X-ray tubes have met some difficulties, which are considered to be physical limits. In order to break the barriers, we are going to develop a new X-ray tube having a revolutionary nano-pillar target, which is produced by nano-fabrication technology.
1. Study on fabrication technology of nano-pillar target:
(1) Development of design and fabrication technology of target:
Using a focused ion beam system (FIB) introduced last year, a small cavity is made on a diamond substrate, and it is filled with tungsten. This is the nano-pillar target, where most of X-ray is generated to achieve resolution of 100nm in FY2011, while the substrate diffuses heat efficiently to endure high electron beam current. We have tried to shrink the size of the target which was 1,000nm in both diameter and height last year, and reached the goal of this year, 300nm and 1,000nm, in diameter and the height, respectively. We have also introduced a thin Ti film covering the diamond substrate, and confirmed it was effective to prevent the damage of the substrate by the irradiated electrons.
(2) Evaluation of target:
We have continued the evaluation of the targets by electron irradiation. Last year, we confirmed no damage of the target for one hour irradiation at 50keV, 10 micro-amperes (0.5W). However, we found out this was not always repetitive, and there was 20% degradation of X-ray emission and some damage after irradiation for one hour at 40keV, 20 micro-amperes (0.8W). To solve this problem, we deposited a thin film made of Ti, as mentioned above. As a result, the endurance is improved very much. No degradation of X-ray emission due to damage was observed after irradiation of electrons at the same condition.
2. Development of electron beam control system:
Since the nano-pillar target is small on the diamond substrate, it is necessary to find the target and irradiate electron beam on it. We developed the electron beam control system to find the target last year. This year, we modified the software of the system to keep electron beam irradiating the target during operation.
In order to converge electrons to the target of 100nm in diameter, we have been studying a high brightness electron gun, TFE (Thermal Field Emitter). We designed an X-ray tube with a TFE to be manufactured and evaluated in the next fiscal year.
3. Verification of each technology and development of prototype:
Using the developed target and the electron beam control system, we have developed an X-ray tube to evaluate the performance as a prototype. As a result, we achieved the spatial resolution of 500nm with a target of which diameter was 1,000nm, the spatial resolution of 250 and 200nm with a target of 500nm and 300nm, respectively. This suggests we can obtain the spatial resolution which is the half of the target diameter. We predict the goal of the spatial resolution, 100nm, can be achieved with a 200nm-diameter target.
ダウンロード成果報告書データベース(ユーザ登録必須)から、ダウンロードしてください。

▲トップに戻る