成果報告書詳細
管理番号20120000000787
タイトル*平成23年度中間年報 太陽エネルギー技術研究開発/革新的太陽光発電技術研究開発(革新型太陽電池国際研究拠点整備事業)/高効率集光型太陽電池セル、モジュール及びシステムの開発(日EU共同開発)/先進構造による高効率集光型太陽電池の開発(WP3)
公開日2012/11/28
報告書年度2011 - 2011
委託先名シャープ株式会社
プロジェクト番号P07015
部署名新エネルギー部
和文要約和文要約等以下本編抜粋:
1.
研究開発の内容及び成果等
本プロジェクト(WP3)では、先行事業である「ポストシリコン超高効率太陽電池の開発(エピタキシャル成長技術)」の成果を適用し、高効率集光型太陽電池の開発を実施する。また開発した集光型太陽電池セルとモジュールをカスタマイズし、公的機関に集光セルやサブセル等のサンプルを提供することで、標準測定技術の確立に寄与するものである。
英文要約Title: R&D on innovative Solar Cells. Ultra-high efficiency concentration photovoltaic’s (CPV) cells, modules and systems. Development of advanced CPV cells (WP3) (FY2011-FY2012) FY2011 Annual Report
In this project high efficiency concentration cells are investigated using the outcome achieved in the preceding NEDO project "Post-silicon solar cells for ultra-high efficiencies (epitaxitial technology)". In addition contribution is asked for "Development of characterization tools for CPV cells, modules and systems (WP4)" by supplying concentrator cells and their subcells to official organizations like National Institute of Advanced Industrial Science and Technology (AIST). Development on invert lattice mismatch triple junction cells composed of InGaP(1.88eV) top cell, GaAs(1.42eV) middle cell and InGaAs(0.98 ~ 1.00eV) bottom cell was done. As a result in 4mm x 4mm size cells, 43.5% efficiency and 42.5% efficiency were confirmed at 300x to 500x concentration ratio in cells with 200μm grid pitch and at 450x to 700x concentration ratio in cells with 125μm grid pitch, respectively. These results which satisfied target value of 42% in FY2012 were obtained in house measurement under AM1.5G spectrum. We will try to reduce series resistance and shadow loss of the cells to improve maximum concentration ratio and to achieve 45% target value in FY2014. Investigation of 4 junction cells was started in collaboration with Tokyo University (TU) and Toyota Technological Institute (TTI). We supplied Ge cell samples to them. After they grow 1eV bandgap cell structure on them, we are planning to grow 2 junction cells again on them and complete 4 junction structure. Meetings with EU organizations were held on June 2011 in Spain and on December 2011 in Miyazaki. Exchange of researchers within 12 months between Sharp and Fraunhofer ISE (Germany) was decided as a milestone in Spain meeting. We fulfilled the milestone by sending two researchers from on March 21st to 23rd to discuss about measurement technology for concentrator cells, III-V epitaxitial technology on Si and wafer bonding technology and so on with researchers of Fraunhofer ISE. Delivery of concentrator cells and their subcells to AIST was also decided in Spain meeting. We supplied those cells to AIST on November 2011 to contribute WP4. We hope to obtain official efficiency data from AIST in the near future. In Miyazaki we were asked to cooperate with Fraunhofer ISE, TU and TTI regarding wafer shuttle to fabricate 4 junction cells similar to our approach. We received Ge cell wafers from Fraunhofer ISE and cut them to suitable size and sent them to TU and TTI on February 2012.
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