成果報告書詳細
管理番号20120000000565
タイトル*平成23年度中間年報 太陽エネルギー技術研究開発 太陽光発電システム次世代高性能技術の開発 極限シリコン太陽電池の研究開発(微細レーザー加工技術による高効率化研究開発)
公開日2012/12/21
報告書年度2011-2011
委託先名三菱電機株式会社
プロジェクト番号P07015
部署名新エネルギー部
和文要約和文要約等以下本編抜粋:
1.研究開発の内容および成果等
微細レーザー加工技術を応用した高効率セル製造プロセス技術の開発として、低反射テクスチャー、高品質接合構造、裏面反射(ポイントコンタクト)構造、低抵抗電極形成技術の開発および最適化を行うと共に、薄型単結晶シリコン基板への適用技術開発を行う。中間目標として平成24年度にセル変換効率20%以上(基板厚さ100μm程度、面積15cm角相当)、最終目標として平成26年度にセル変換効率25%以上(基板厚さ100μm程度、面積15cm角相当)、およびモジュール変換効率20%以上の実現を目指し、平成23年度は以下の研究開発を実施した。
英文要約Title: High Performance PV Generation System for the Future. R and D on Ultimate Wafer-based Si Solar Cells. (Improvement of Solar Conversion Efficiency by Development of Laser Microfabrication Process) (FY2010-FY2012) FY2011 Annual Report
We have developed the low-reflectance texturing process and optimized the structure of the fine line electrodes for the fabrication of the high-efficiency single crystalline Si solar cells. We have applied the honeycomb texturing technique by a laser pattering process to the fabrication of the inverted pyramid structure on the surface of the Si substrates. In addition, we have studied for the thinning of the fine-line electrodes through a screen printing method, and the Ag plating method for the fabrication of the low resistance fine-line electrodes. For a development of thinner electrodes, we successfully reduce the width of the electrode by 40% and increase the height by 50%. As a result, the short-circuit current increases by around 1 mA/cm2 (in-house measurement). Furthermore, we have applied the Ag plating method to the front surface of the Si substrate. The surface is coated by the antireflection (AR) layer, and some of the regions are partially etched to form the opening pattern on AR layer. Before plating, the activation treatment is performed at the opening area. The Ag electrodes are successfully fabricated only at the opening area, where the impurities are diffused. As a next task, we will improve the plate adhesion and reduce the effect of the roller mark during the transfer. In next fiscal year, we will apply these techniques to the fabrication of high-efficiency Si solar cells and reach the target conversion efficiency as soon as possible.
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