成果報告書詳細
管理番号20130000000396
タイトル*平成24年度中間年報 次世代素材等レーザー加工技術開発プロジェクト 次世代レーザー加工技術の研究開発(4)
公開日2013/5/31
報告書年度2012 - 2012
委託先名株式会社アルバック
プロジェクト番号P10006
部署名技術開発推進部
和文要約
英文要約Title: Research and development of basic technologies for the high power and advanced laser beam machining. [Development of the combined laser beam machining technologies with multi-wavelength laser beams. / Development of laser surface processing technologies] (FY2010-FY2012) FY2011 Annual Report

(1) The development of the highly homogenized wide laser-beam
A) Planning:
To develop a line-shape wide beam with the good energy uniformity along the long axis

For Si crystallization equipment in the TFT panel mass-production process, both the laser oscillators with high power and high stability and the high quality lenses are required as a component of hardware to obtain an appropriate annealing result. In this project they had been developed individually for last two years and have completed with required specifications.

This year, we had planned to combine them as an annealing system and we had planned to compose a line-shaped wide beam (over 500mm wide) which was the final target of this project.

B) Results:
The high-output laser oscillator had been developed by ALPROT team, mainly HAMAMATSU PHOTONICS K.K., at Institute of Laser engineering of Osaka University and the laser output power was confirmed to be the energy of 140mJ with the green beam(λ=532nm) at the beginning of December, 2012. (project (2)) Then, it had been moved from there to ULVAC at the end of December.

Some of optical lenses were ground more to make the annealing line-shape beam wider (up to 700mm wide, that is adaptable to manufacture a large TFT array panel, such as 55inch TV). All lenses ground with this new machine were confirmed to be a quality product in lens maker's judgment.

The 700mm wide optical unit bench was designed so that the ultra-large lenses could be mounted safely on it. Some parts of ULVAC's reusable laser annealing machine, such as an annealing chamber, a laser irradiation stage and the electrical control systems, were reused as a part of annealing system. The laser oscillator and a set of lenses were arranged along the beam line of the optical bench. The laser oscillator was re-tuned to be able to irradiate with the Gaussian-shape beam energy of 140mJ at the beam exit of the oscillator body.

The Gaussian laser beam was changed into line-shape beam with the use of a set of optical lenses. It was found that the width of laser beam was widened to 700mm although the beam focus along the short axis was not enough to crystallize an annealing object.

(2) The development of highly precise grinding technique of ultra-large lenses
A) Planning:
To make the area of highly precise grinding lens wider (up to 700mm)

B) Result:
We continued to grind the ultra-large lens material. The 700mm wide lens was obtained with the enough quality in lens maker's judgment. It was wider than the target specification of this project. We are going to precisely evaluate the annealing MURA using the practical laser beam from next term of project, because we considered that is more remarkable way to reveal the accuracy of grinding procedure than lens maker's judgment.

(3) The development of highly precise beam evaluating unit
A) Planning:
To produce the laser beam monitoring unit

The line-shaped laser beam energy uniformity must be evaluated with highly precise energy monitor for all range along long axis.

B) Result:
We considered the concept of high accuracy beam monitoring system, although it could not be created because of the termination of manufacture of several parts to use. So, we will reconsider new concept and are plan to make the new one from next term of project.
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