成果報告書詳細
管理番号20120000001197
タイトル*平成23年度中間年報 太陽エネルギー技術研究開発 太陽光発電システム次世代高性能技術の開発 薄膜シリコンフィルム太陽電池の高速製膜技術の研究開発
公開日2013/6/25
報告書年度2011 - 2011
委託先名富士電機株式会社
プロジェクト番号P07015
部署名新エネルギー部
和文要約
英文要約Title: R&D of high-rate deposition techniques for thin-film silicon solar cells on film substrates

The objective of this project is to develop high-quality and high-growth rate deposition techniques of thin-film silicon solar cells on flexible film substrates and apply them to high-output and high-reliability solar modules. To achieve this, we have set three subprojects: 1) high-growth rate deposition techniques of single-junction solar cells, 2) fabrication techniques of multi-junction solar cells and 3) production techniques of solar modules.

We obtained three results in this year. 1) Single-junction solar cells: we studied the relation between deposition conditions and growth rate of amorphous silicon germanium thin films and obtained a growth rate over 0.67nm/s, which was as high as our target rate. 3-1) Series-connection structure: we fabricated what we call SCAF(the Series-Connection structure through Apertures formed on Film substrate) structure with double-junction solar cells (μc-Si/a-Si). The power loss by making such a structure was 21%, which was larger than our target (under 15%). The stabilized efficiency of a submodule with an area of 70 cm2 was 8.4%. We are going to reduce the power loss to improve the efficiency. 3-2) Reliability of solar modules: we carried out a damp heat test (85℃, over 85%RH)of a 53-cm2 submodule with double-junction solar cells (μc-Si/a-Si) . After 3400 h the power drop of the submodule was 4%, which was lower than our target (under 10%). We are going to try submodules over 100 cm2.
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