成果報告書詳細
管理番号20170000000079
タイトル*平成27年度中間年報 高性能・高信頼性太陽光発電の発電コスト低減技術開発 先端複合技術型シリコン太陽電池、高性能CIS太陽電池の技術開発 高効率バックコンタクト型太陽電池の量産技術開発
公開日2017/3/31
報告書年度2015 - 2015
委託先名シャープ株式会社
プロジェクト番号P15003
部署名新エネルギー部
和文要約
英文要約Title: Development of High Performance and Reliable PV Modules to Reduce Levelized Cost of Energy Development of Crystal Silicon PV Modules Using Advanced Multiple Technologies and High Performance CIS Modules Mass Production Technology Development of High Efficiency Hetero Junction Back Contact Solar Cell FY2015 Annual Report

 We achieved 25.1% cell conversion efficiency in the previous NEDO project (High Performance PV Generation System for Future R and D on Ultimate Wafer-based Si Solar cell) (FY2010 - FY2014). In this project, we have focused on mass production technology development of high efficiency heterojunction back contact (HBC) solar cells.
 Since the purpose of this project is the development of mass production technology without use of expensive process such as photolithography, we have investigated to replace an expensive process with an inexpensive process as much as possible. Also, to improve cell characteristics, the optimization of each layer thickness and dopant level for semiconductor films have been done and the improvement of the passivation layer, the cleaning method and the light-receiving surface structure, etc. have been carried out. As a result, we have obtained a cell conversion efficiency of 24.0% with the small-area cells (4 cm2), which is approaching the cell conversion efficiency in the case of using the photolithography process (25.1%). The cell conversion efficiency of 22.9% has been obtained with the large area cells (209.5 cm2). In addition, as a high Voc has been obtained of more than 730 mV, it can be seen that basically good heterojunction interface is formed. On the other hand, there is a certain characteristics difference between the small area cell and the large area cell. It can be expected to improve the cell performance by reducing the characteristics distribution. We also accelerate to develop module technology for mass production to reduce total cost.
 We have carried out the detailed specification study for each process based on the results so far and have introduced some mass production verification machines such as electrode forming apparatus which aims to achieve both high quality and low cost, the mask alignment device suitable for the mask deposition method which is one candidate for patterning technique, the new cleaning equipment and so on to accelerate the mass production technology development.
We have also proceeded with investigation in cooperation with several universities. We have cooperated with Japan Advanced Institute of Science and Technology (JAIST) for optimization of the light-receiving surface structure. From a study of relation between cleaning method and the passivation film, it has been obtained high life time for the cell. Also we plan to cooperate Toyota Technological Institute, Meiji University, Kyushu University, Tokyo Institute of Technology, Nagoya University and University of Hyogo for the defect analysis of hetero junction cells and a high quality silicon wafer preparation with low cost.
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