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EUV Light Source Achieves 250W Output at 4.0% Conversion Efficiency
-Success in Light Emission Levels Capable for Use in State-of-the-Art Semiconductor Mass Production-

July 6, 2016
New Energy and Industrial Technology Development Organization (NEDO)
Gigaphoton Inc.

As part of a NEDO project, Gigaphoton Inc. successfully achieved 250W light output at 4.0% conversion efficiency with a Laser-Produced Plasma (LPP) light source prototype intended for use in extreme ultraviolet (EUV) scanners, which the company is currently developing. At this output level, the light source can be used to manufacture state-of-the-art semiconductors in large quantities. Gigaphoton Inc. also achieved 119 hours of continuous operation at over 130W. These achievements mark significant progress towards the implementation of EUV scanners for use in mass production.

For more information, please contact:

(Regarding this News Release)
NEDO Energy Conservation Technology Department
Tel: +81-44-520-5281­
Contact persons: Tateiwa, Iwatsubo

Gigaphoton Inc. Corporate Planning Department
Tel: +81-285-37-6931­
Contact person: Matsui