成果報告書詳細
管理番号100013724
タイトル*平成20年度中間年報 平成20年度次世代半導体材料・プロセス基盤技術の開発 次世代半導体材料・プロセス基盤(MIRAI)プロジェクト(石特会計) EUV光源高信頼化技術開発
公開日2009/4/24
報告書年度2008 - 2008
委託先名技術研究組合極端紫外線露光システム技術開発機構
プロジェクト番号P01014
部署名電子・情報技術開発部
和文要約以下本編抜粋:1「光源起因マスク、ミラーの汚染評価技術の開発」1-1)LPP光源における「光源起因マスク、ミラーの汚染評価技術の開発」LPP光源側より発生する燃料デブリの流入計測技術として、LIF(レーザ誘起蛍光法)を用いたSn計測技術の開発を進めた。まず発光点近傍のSn原子のLIF計測を行い、液体Snターゲットプラズマから発生するSn原子のイメージを時間分割で観測した。
英文要約Title: FY2008 Annual Report on the Research Project for Basic Technologies of EUV Lithography System (FY2008-FY2009) The results of the project are as follows; (as of March 2009) 1-1) Evaluation Technologies of Debris due to LPP EUV Source In order to evaluate Sn neutral atom, which will be a kind of debris, flowing from LPP source into exposure optics, LIF (Laser Induced Fluorescence) method has been investigated. LIF signal at around plasma source was successfully detected. Furthermore, the photon counting system has been installed to detect weak LIF signal at around IF position. 1-2) Evaluation Technologies of Debris due to DPP EUV Source. Evaluation tool of exposure optics degradation (mirrors and mask) by debris from DPP source has been developed. This tool has three vacuum chambers: exposure, transfer and analysis chambers, which makes possible to measure reflectivity and analyze source quality in vacuum environment. 2-1) Debris Mitigation and Cleaning Technologies for LPP Source A magnetic guiding system for Sn ion emitted from plasma was effectively functional on LPP source of Sn-droplet/CO2 laser. However, thin Sn film deposition was observed on sample mirror, which may indicate the existence of neutral Sn. ECR method was experimented and it can be one of the promising methods to ionize neutral Sn atom. 2-2) Debris Mitigation and Cleaning Technologies for DPP Source Movable foil trap was developed for catching Sn particles emitted from DPP source. More than 90% Sn particles can be trapped by the trap. This foil trap, together with buffer gas flow is very effective to suppress Sn debris deposition. 3-1) Thermal Management for LPP Source Heat loading, as well as thermal deformation of collector mirror due to high energy plasma was estimated by simulation. On the basis of this thermal analysis, new collector with cooling system was designed for HVM LPP source. 3-2) Thermal Management for DPP Source Heat loading and thermal deformation of grazing incidence collectors were simulated. As a result, both temperature increase and thermal deformation can be alleviated by optimizing water-cooling system. 4) IF Position Stability for DPP Source A new IF alignment system was developed to maintain EUV power level and its angular distribution at IF. This system enables not only to monitor EUV power and far-field profile, but also to correct collector position via fuzzy algorithm within 2 minutes.
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