成果報告書詳細
管理番号20090000000280
タイトル*平成20年度中間年報 エネルギー使用合理化技術戦略的開発/エネルギー使用合理化技術実用化開発/大容量ストレージのためのナノマスタリング技術の研究開発
公開日2009/9/15
報告書年度2008 - 2008
委託先名財団法人光産業技術振興協会
プロジェクト番号P03033
部署名省エネルギー技術開発部 研究開発グループ
和文要約以下本編抜粋:1.研究開発の内容及び成果等 平成19 年6 月に開始した本プロジェクトでは、記録密度300 ギガ-1テラビット/inch2 対応の大容量ストレージのためのナノマスタリング技術(シリコンやガラス円盤にレジストを塗布し、フォーマッタ(必要なパタ-ンを描画するために電子ビーム描画装置を制御するための信号発生装置)で生成した所定のナノパターンを電子ビーム描画装置で描画し現像してレジスト原盤を作製し、このレジスト原盤から電鋳で金型のスタンパーを作成する技術)の実用化開発を行う。また、光ディスク装置用と、固定型ディスク装置用とでは、ディスク円盤の直径、ナノパターンの加工サイズ、ナノパターンの配列等、要求仕様が異なり、それぞれに対応したナノマスタリング技術の開発が必要となる。そこで、平成19-21 年度で、以下の項目に示すとおり記録密度300 ギガビット/inch2の光ディスク(現在の約16 倍の記録密度)に対応するナノマスタリング技術と、記録密度500 ギガ-1テラビット/inch2 の固定型ディスク(現在の約2.5-5 倍の記録密度)に対応するナノマスタリング技術を開発し、開発した技術について外部評価等を通じて、要求仕様に応じて原盤からスタンパーに至る作製条件を最適化し、製品レベルの原盤、スタンパーを確実に作製する実用化技術としての確立を目指す。
英文要約Title: Nano-mastering Technology Development Project for Terabyte Storage (FY2007-FY2009) FY2008 Annual Report 1. Nano-mastering for optical disk media with 300 gigabit/inch2 density : The target of this theme is to develop the practical nano-mastering technology toward areal density of 300 gigabit/inch2 for optical disk media. The research objective in 2008 FY was verification of the nano-mastering technology with 140 gigabit/inch2 recording density. We optimized the recording velocity in the electron beam recording process and optimized the electroforming condition to make a stamper from a Si master disk. We achieved to make a Si master disk and a Ni stamper with 140 gigabit/inch2 recording density without defect in the pit shape. Furthermore, by considering the mass production, we started to make duplicated master disks from the original one. We will continue this investigation for the last fiscal year 2009 by using the electroforming process. 2. Nano-mastering for hard disk media with 500 gigabit – 1 terabit/inch2 density : The target of this theme is to develop the practical nano-mastering technology toward areal density from 500 gigabit to 1 terabit/inch2 for hard disk (HD) media. The research objective in 2008 FY was verification of the prototyping of the HD mastering for DTR (discrete track recording) and servo, by using developed general formatter system of which functions were verified. We achieved e-beam diameter of 6 nm, e-beam current of 14 nA and current density of 34 kA/cm2 by the second conditioning of rotary-stage e-beam recorder (EBR) with 100-kV e-beam column. By using the general formatter system for HD, we fabricated the master on which 500 gigabit/inch2 HD pattern with DTR and servo was drawn by means of the 100 kV EBR. We made the prototyped nickel stamper using the master. We confirmed excellent plating in microscopic groove of 30 nm width by cross-sectional TEM. In order to form high aspect ratio pattern with narrow track pitch, we investigated super critical CO2 drying process. We were able to make both 50-nm-pitch groove on 100-nm-thick resist and 40-nm-pitch groove on 70-nm-thick resist without resist collapse. Moreover we began development of drawing perfect circle that is necessary for HD servo pattern, and we indicated that roundness error of the drawn concentric circles on the master was able to be reduced. We confirmed stability of drawing conditions and alignments of the patterns for HD by drawing whole area of 1.8inch HD. We fabricated DTR media patterns with 88-nm-pitch track on current perpendicular HD media by nanoimprinting method which could form etching mask patterns on the media. We confirmed by SEM observation that accurate pattern transfers on a magnetic recording layer were achieved. We also confirmed by a spin-stand tester that servo following control were accomplished on rotating disks by flying magnetic read heads.
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